Graphite Target - China

Graphite Target

Graphite (C) sputtering targets are widely used in the Physical Vapor Deposition (PVD) process for depositing thin carbon films onto substrates.

Graphite targets are characterized by high temperature resistance, self-lubrication, corrosion resistance, and good electrical conductivity.

When using graphite as a target material, different materials are used depending on the industry.

The sputtering process involves bombarding a target with high-energy plasma ions, which strips atoms from the surface of the target and deposits them on the substrate to form a thin film.

Graphite sputtering targets are made from high-purity graphite material and come in a variety of shapes and sizes, such as discs, rectangular tiles and custom shapes.

Graphite sputtering targets are very durable and provide consistent, high quality films in the PVD process.

They offer excellent thermal and electrical conductivity, good adhesion to the substrate, and high hardness for use in high-temperature, high-pressure environments.

Company Contact:

• Posted By: Advanced Targets Materials Co., Ltd

• Phone: 13810586569

• Address: No.9 Keyuan Road, High Tech Industrial Development Zone, Zhuozhou City, HeBei, China, Zhuozhou , HeBei , China

• Email:

• Website: https://www.atargets.com/

• Business Description: Advanced Targets Materials Co., Ltd is one of the leading manufacturers of sputtering targets, arcing cathodes and evaporation materials for the PVD thin film companies worldwide.
  
  Advanced Targets has rich experience in manufacturing and R&D on sputtering targets and arcing cathodes.
  
  Driven by the spirit of innovation, Advanced Targets achieved lots of R&D progress, and some are worked together with Institute of Process Engineering Chinese Academy of Sciences, national center for Non-Ferrous Metals & Electronic Materials.