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  • Planar Ceramic Sputtering Target - China

    price: contact company for price

    Planar Ceramic Sputtering Target

    Excellent properties such as high purity, high density, Good microstructure uniformity, excellent electrical properties.

    High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.

    We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals.

    Also have controlled specific impurities within the target.

    High density: Metal targets have high density characteristics, usually up to 95-99.5%, (ITO, NbOx can reach 99.5%) to ensure the stability and quality of materials.

    High thermal conductivity: the thermal conductivity of the metal target is particularly high, which can be cooled quickly and improve the coating speed.

    Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target.

    Excellent electrical properties: Reliable atmosphere sintering enables stable electrical conductivity of oxides with semiconductor characteristics.

    * Maximum sizes of planar target

    Thickness: 30mm (can be 60mm for round target) Width: max 2000mm

    Length: max 4000mm * Maximum sizes of rotary target

    Vacuum/Air Spraying

    Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm

    Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm

    Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm

    Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm Bonding

    Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm * Planar/Rotary target can be customised as per your request.

    Chemical Formula Purity Forms Specification

    SiO₂ 99.995% Planar Customized

    Nb₂Ox 99.99% Planar / Rotary Customized

    TiOx 99.99% Planar / Rotary ACETRON is a comprehensive company integrated with R& D, manufacturing and selling of PVD coating materials, mainly engages in sputtering target, evaporation material and evaporation accessories for high precision optical lenses& Optical communication, semiconductors, LOW-E glass& Automotive glass, LCD display & touch panel and surface decoration.


    Company Contact:


    • Phone: 15375906883

    • Address: No.66 Zhanghu Rd, Zhang'gang Sub-Dist, Changle Dist, Fuzhou , Fujian , China

    • Email: Email


    Published date: March 27, 2024

    • Business Description: Fujian Acetron New Materials Co., Ltd, founded in 2002, is a comprehensive company integrated with R& D, manufacturing and selling of coating materials.

      Mainly engages in sputtering target, evaporation material and evaporation accessories for high precision optical lenses& Optical communication, semiconductors, LOW-E glass& Automotive glass, LCD displayer & Tablet touch screen and surface decoration.

      Our Products:

      - Planar Alloy Sputtering Target

      - Planar Ceramic Sputtering Target

      - Planar Metal Sputtering Targets

      - Rotary Metal Sputtering Targets

      - Rotary Ceramic Sputtering Target

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