Dual Target Rf Magnetron Sputtering Coater With Film Thickness Gauge - China

Dual-target RF magnetron sputtering coater with two film thickness gauges CY-MSP300S-2RF-FG is a cost-effective vacuum PVD coating equipment independently developed by our company.

It is standardized, modular and customizable.

There are 1-inch or 2-inch magnetron targets for you to choose.

Customers can choose the target according to the size of the substrate to be coated.

The device is equipped with 300W RF power supply and RF power supply can be used for the preparation of non-metal films.

The two targets can meet the needs of multi-layer coatings.

If customers have other coating needs, DC power supply and pulse power supply can be customized.

Various types of power supply are available from 300W to 1000W in various specifications.

The coating machine has a two-channel high precision mass flow meter.

If customers have other requirements, the gas channel of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements.

The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase.

In addition, this machine is equipped with two high precision film thickness gauges, which can meet the film thickness detection requirements during the coating process.

If customers need to install multiple film thickness gauges, also can contact our technical staff for customization.

This product can be equipped with an integrated industrial computer to control the system.

In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like.

Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

Dual-target RF magnetron sputtering coater

technical parameters:

Sample stage Size: φ185mm

Temperature control accuracy: ±1℃

Heating temperature: Max 500℃

Rotate speed: 1-20rpm adjustable

Magnetron Sputtering target head Quantity: 2”×2 (1”, 2” optional)

Water chiller: Circulating water chiller with flow rate of 10L/min

Vacuum chamber Chamber size: φ300mm×300mm

Watch window: φ100mm

Chamber material: Stainless steel

Opening mode: Top cover open

Mass flowmeter 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)

Vacuum system Model: CY-GZK103-A

Pumping interface: KF40

Molecular pump: CY-600

Exhaust interface: KF16

Backing pump: rotary vane pump

Vacuum measurement: Compound vacuum gauge

Ultimate vacuum: 1.0E-5Pa

Power supply: AC;220V 50/60Hz

Pumping rate: Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes

Power configuration RF power supply×2;Max output power: RF 300 W

Other parameters Supply voltage: AC220V, 50Hz

Overall size: 600mm×650mm×1280mm

Total power: 2.5KW

Total Weight: About 300kg

Company Contact:

• Posted By: Zhengzhou CY Scientific Instrument Co., Ltd.

• Phone: +86 371 5519 9322

• Address: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China, zhengzhou , henan , China

• Email:

• Website: https://www.cysi.wang

• Business Description: Founded in 2013 by a group of professional engineers.
  
  CY is a high and new technology enterprise registered in Zhengzhou,Henan province.
  
  CY Scientific Instrument mainly provide regular furnace for lab.
  
  Also do customized furnace and some other related accessories and equpments in high quality and low cost precision machines for material research and R&D lab.