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Niobiuim Sputtering Target - China
price: check with company for price
Niobium Sputtering Target, Rotary Targets, 99.95(3N5)-99.99%(4N) Purity - Coating Material ISO9001 Application: Niobium Sputtering Targets are used as coating materials for semiconductors and optics, anticorrosion materials for ships, chemical vessels.
LCD etc.
Specifications: Typical Analysis: 99.99%(4N) Metallic impurities, ppm max by weight Balance: Niobium Element Mn Al Cu Si Hf Cr Mo Ni Fe Ta Ti W Zr Content 5 5 10 30 20 5 10 5 20 200 5 15 50 Non-Metallic impurities, ppm max by weight Element C H O N Content 50 10 100 50 Grain Size: Typical size: 30-80μm Other grain size available upon request Recrystallization: 95%min Surface Roughness<1.6μm Density: highest possible, higher density increases the sputtering rate and enhances the electrical and optical properties of the film
Company Contact:
- Posted By: Baoji Towin Rare Metals Co., Ltd
- Phone: +8615814887696
- Address: No.1 workshop, Caijiapo Economic Development Zone, Baoji-qishan , Shaanxi , China
- Email:
- Website: http://www.baojitowin.com
Published date: November 7, 2018
- Business Description: We are manufacturing 3N5-4N tantalum ingot, tantalum plate, tantalum sheet, tantalum strip, tantalum foil, tantalum tube, tantalum rod, tantalum wire, tantalum sputtering targets, niobium ingot, niobium plate, niobium sheet, niobium strip, niobium foil, niobium tube, niobium wire, niobium rod, niobium sputtering target, niobium fabricated parts.
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